Isolated 170 as Pulse Generation in the XUV

Ultraviolet femtosecond pulses: Key technology for sub-micron machining and efficient XUV pulse generation

A new scheme to increase the extractable energy from a table-top KrF amplifier up to 100 mJ/pulse is presented. Applications of such pulses for micro-machining and for the generation of powerful XUV radiation are demonstrated. PACS 42.60.Da; 42.65.Ky; 81.40.-z

High Intensity Femtosecond XUV Pulse Interactions with Atomic Clusters

The interactions of large xenon clusters irradiated by intense, femtosecond extremeultraviolet pulses at a wavelength of 38 nm have been studied. Using high harmonic generation from a 35 fs near-infrared terawatt laser, clusters have been irradiated by XUV pulses of 10 W/cm intensity. Charge states up to Xe are observed, states well above that produced by single atom illumination, indicating th...

Ponderomotive streaking of the ionization potential as a method for measuring pulse durations in the XUV domain with fs resolution

We present an alternative method for measuring ultrashort extreme-ultraviolet pulses that can be synchronized with an intense infrared pulse. The method, based on photoionization of a target atom by the extremeultraviolet pulse in the presence of the infrared pulse, has a potential accuracy of close to 1 fs and is susceptible to single-shot operation. It is demonstrated on harmonic 15 of a tita...

Free Electron Generation of Xuv Coherent Light

Isolated sub-100-as pulse generation by optimizing two-color laser fields using simulated annealing algorithm.

We propose a method to broaden the cut-off region of high harmonic generation by optimizing the parameters of two-color laser fields synthesized by an intense 5 fs pulse at 800 nm and a relatively weak, subharmonic pulse at 2400 nm. Simulated Annealing (SA) algorithm is employed to optimize the electric field amplitude, pulse duration of the control pulse, and the time delay between two pulses....